MoSN/MoS2 multilayer films were deposited by a sputtering MoS2 target in alternate\nAr and Ar/N2 mixed atmospheres with different nitrogen flow rates. The influence of nitrogen\nflow rates on the microstructure, mechanical and tribological properties of the prepared films were\ninvestigated. The multilayer film exhibited the preferred orientation of (002) plane for MoS2 sublayers\nand amorphous structure for MoSN sublayers. Introducing N2 into the source gas resulted in a much\nmore compact structure for multilayer films due to the suppression of columnar growth of MoS2 film.\nWith the increase of the nitrogen flow rate, the hardness of the multilayer film firstly increased from\n2.3 to 10.5 GPa as the nitrogen flow rate increased from 4 to 10 sccm and then turned downwards\nto 6.5 GPa at 20 sccm. MoSN/MoS2 film deposited with an optimized microstructure exhibited\nlow friction coefficients below 0.03 and a wear life higher than 1.8*10^5 revolutions in vacuum.\nMeanwhile, the optimized film showed an ultralow friction coefficient of 0.004-0.01 and wear rate\nof 4.7 * 10^-7 mm3/N.m in an ultrahigh vacuum. Both the enhanced hardness by N-doping and\nsustainable formed MoS2 tribofilm contributed to the improved tribological property of MoSN/MoS2\nmultilayer film..
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